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oxygen precipitation in Chinese

Pronunciation:
How to pronounce "oxygen precipitation""oxygen precipitation" in a sentence

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  • 氧沉淀

Examples

  • Effects of germanium on oxygen precipitation in heavily boron - doped czochralski silicon
    鍺對(duì)重?fù)脚鹬崩柚醒醭恋淼挠绊?i class="labawb" onClick="playMp3('sound_c_1')">
  • Oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction
    硅片氧沉淀特性的測(cè)定-間隙氧含量減少法
  • Test methods for oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction
    通過(guò)測(cè)量間隙氧含量的減少表征硅片氧沉淀特性的方法
  • Finally , the effect of rapid thermal process ( rtp ) on oxygen precipitation in hb is investigated in this paper
    最后文章還系統(tǒng)研究了快速熱處理( rtp )對(duì)重?fù)脚鸸鑶尉е醒醭恋淼挠绊憽?
  • Fumio shimura , et al . carbon enhancement effect on oxygen precipitation in czochralski silicon [ j ] . j appl phys , 1986 , 59 : 3251
    劉培東,朱愛(ài)平,張錦心等.碳和氮原子在氧沉淀中的作用[ j ] .半導(dǎo)體學(xué)報(bào), 1999 , 20 : 107
  • The experimental results showed that high density of oxygen precipitation and induced - defects were formed after annealing of wafers at moderate and high temperatures
    重?fù)缴楣鑶尉г谥懈邷赝嘶饡r(shí)形成密度較高的氧沉淀及誘生缺陷。
  • The nucleation temperature of oxygen precipitation is about 750 c in lightly doped czsi , while the nucleation in heavily as - doped si occurred at a higher temperature ( 750 - 900 c )
    普通直拉硅氧沉淀在低溫750形核,重?fù)絘s硅單晶形核溫度較高,在750 - 900之間。
  • Both the size and density of oxygen precipitation increase with the annealing time , and the size of oxygen precipitation decrease with the increase of the annealing temperature
    隨著退火時(shí)間的延長(zhǎng)氧沉淀尺寸增大,密度略有增加;隨著退火溫度的升高,氧沉淀尺寸相對(duì)減小。
  • A modified ig process was suggested , through which a wider denuded - zone ( dz ) on the surface of wafers and higher density of oxygen precipitation in silicon bulk were obtained
    使用改進(jìn)的內(nèi)吸除工藝,在重?fù)缴楣杵砻嫘纬闪溯^寬的清潔區(qū),體內(nèi)形成了較高密度的氧沉淀和誘生缺陷。
  • Tem showed that the faults and dislocation loops introduced by the oxygen precipitation were formed when the wafers were annealed at moderate temperature , and polyhedral oxygen precipitation was generated at high temperature
    對(duì)氧沉淀形態(tài)及誘生缺陷進(jìn)行了tem測(cè)試分析,結(jié)果表明,在中溫退火時(shí)出現(xiàn)氧沉淀引起的層錯(cuò)和位錯(cuò)環(huán);在高溫退火后生成了多面體形狀的氧沉淀。
  • More examples:  1  2
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